THA03
KEK, Ibaraki, Japan
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THA03 |
IR-FEL Project at the cERL and Future EUV-FEL Lithography | |
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| Recently KEK has launched an infrared FEL project with a competitive funding from NEDO (New Energy and Industrial Technology Development Organization). The purpose of this project is to build a mid-infrared FEL at the compact Energy Recovery Linac (cERL), and to use that FEL as a light source for construction of the processing database required for industrial lasers. The FEL system is composed of two 3 m undulators and a matching section between them, and generates light with a maximum pulse energy of 1 µJ at the wavelength of 20 µm with an 81.25 MHz repetition rate. The FEL is also expected to become a proof-of-concept machine for ERL base FELs for future EUV lithography. The detail of the project will be presented, and the relationship of the technical development between the mid-infrared FEL and the future EUV-FEL will be discussed. | ||
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Slides THA03 [5.424 MB] | |
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