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RIS citation export for WEP056: Engineering Design of Low-Emittance DC-SRF Photocathode Injector

TY  - CONF
AU  - Liu, Y.Q.
AU  - Chen, M.
AU  - Huang, S.
AU  - Lin, L.
AU  - Liu, K.X.
AU  - Quan, S.W.
AU  - Wang, F.
AU  - Zhao, S.
ED  - Schaa, Volker R.W.
ED  - Decking, Winfried
ED  - Sinn, Harald
ED  - Geloni, Gianluca
ED  - Schreiber, Siegfried
ED  - Marx, Michaela
TI  - Engineering Design of Low-Emittance DC-SRF Photocathode Injector
J2  - Proc. of FEL2019, Hamburg, Germany, 26-30 August 2019
CY  - Hamburg, Germany
T2  - Free Electron Laser Conference
T3  - 39
LA  - english
AB  - An upgraded version of DC-SRF photocathode injector (DC-SRF-II) is under development at Peking University. The goal is to achieve an emittance below 0.5 mm-mrad at the bunch charge of 100 pC and repetition rate of 1 MHz. The engineering design of the DC-SRF-II photoinjector was accomplished in this May and the fabrication is ongoing now. This paper presents some details of the engineering design.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 460
EP  - 462
KW  - SRF
KW  - cathode
KW  - cavity
KW  - linac
KW  - shielding
DA  - 2019/11
PY  - 2019
SN  - ""
SN  - 978-3-95450-210-3
DO  - doi:10.18429/JACoW-FEL2019-WEP056
UR  - http://jacow.org/fel2019/papers/wep056.pdf
ER  -