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RIS citation export for MOP020: Sideband Instability in a Tapered Free Electron Laser

TY - CONF
AU - Tsai, C.-Y.
AU - Wu, J.
AU - Yang, C.
AU - Yoon, M.
AU - Zhou, G.
ED - Bishofberger, Kip:Carlsten, Bruce (LANL, Los Alamos, NM, USA)[ORCID:0000-0001-5619-907X]
ED - Schaa, Volker RW
TI - Sideband Instability in a Tapered Free Electron Laser
J2 - Proc. of FEL2017, Santa Fe, NM, USA, August 20-25, 2017
C1 - Santa Fe, NM, USA
T2 - International Free Electron Laser Conference
T3 - 38
LA - english
AB - For a high-gain tapered free electron laser (FEL), it is known that there is a so-called second saturation point where the FEL power growth stops. Sideband instability is one of the major reasons leading to this second-saturation and thus prevents reaching terawatt-level power output in an X-ray FEL. It is believed that a strong taper can effectively suppress the sideband instability and further improve the efficiency and peak power. In this paper, we give quantitative analysis on the necessary taper gradient to minimize the sideband growth. We also discuss the transverse effects of induced electron de-trapping which is yet another major reason for the occurrence of the second-saturation point even with a strong enough taper. The study is carried out analytically together with numerical simulation. The numerical parameters are taken from LCLS-II type electron bunch and undulator system.
PB - JACoW
CP - Geneva, Switzerland
SP - 76
EP - 79
KW - ion
KW - electron
KW - undulator
KW - FEL
KW - laser
DA - 2018/02
PY - 2018
SN - 978-3-95450-179-3
DO - 10.18429/JACoW-FEL2017-MOP020
UR - http://jacow.org/fel2017/papers/mop020.pdf
ER -