TUWZO02
IMP/CAS, Lanzhou, People’s Republic of China
UCAS, Beijing, People’s Republic of China
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TUWZO02 |
Tentative Solution to Plasma Chamber Cooling for High Power ECR Ion Source Operation | |
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| High charge state electron cyclotron resonance ion source (ECRIS) is characterized by a so-called min-B magnetic field configuration, which provokes the localized plasma over-heating to plasma chamber especially for the 3rd generation ECRISs at high power operation condition. With the increase of rf power, more plasma energy will be dumped to tiny areas and result in a very high localized power density, which is estimated to be up to 1 kW/cm2. Few existing ECR plasma chamber cooling designs can withstand such high heat fluxes. In this paper, we report a new plasma chamber cooling design with so-called Micro-channel cooling technology, which can not only realize efficient heat transfer, but also retains a small radial thickness that is beneficial for the radial magnetic field. In order to evaluate the performance of the cooling structure with micro-channel design, experimental cooling loop for high heat flux has been designed and built at IMP. Initial experiments demonstrate that optimized configuration can achieve high heat flux cooling in the range of 1 kW/cm2 and beyond. Based on these results, a plasma chamber with micro-channel design for SECRAL has been designed and tested. | ||
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Slides TUWZO02 [9.402 MB] | |
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