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https://doi.org/10.18429/JACoW-ECRIS2020-TUXZO03
Title Angular Distribution Measurement of Atoms Evaporated from a Resistive Oven Applied to Ion Beam Production
Authors
  • T. Thuillier, A. Leduc
    LPSC, Grenoble Cedex, France
  • O. Bajeat, A. Leduc, L. Maunoury
    GANIL, Caen, France
Abstract A low temperature oven has been developed to produce calcium beam with Electron Cyclotron Resonance Ion Source. The atom flux from the oven has been studied experimentally as a function of the temperature and the angle of emission by means of a quartz microbalance. The absolute flux measurement permitted to derive Antoine’s coefficient for the calcium sample used : A=8.98± 0.07 and B=7787± 110 in standard unit. The angular FWHM of the atom flux distribution is found to be 53.7±7.3 °at 848K. The atom flux hysteresis observed experimentally in several laboratories is explained as follows: at first calcium heating, the evaporation comes from the sample only resulting in a small evaporation rate. once a full calcium layer has formed on the crucible refractory wall, the caclcium evaporation surface includes the crucible’s enhancing dramatically the evaporation rate for a givent temperature. A Monte-Carlo code, developed to reproduce and investigate the oven behaviour as a function of temperature is presented. A discussion on the gas regime in the oven is proposed as a function of its temperature. A fair agreement between experiment and simulation is found.
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Conference ECRIS2020
Series International Workshop on ECR Ion Sources (24th)
Location East Lansing, MI, USA
Date 28-30 September 2020
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Guillaume Machicoane (FRIB-MSU, East Lansing, MI, USA); Alexa Allen (FRIB, East Lansing, MI, USA); Ana Lesage (FRIB, East Lansing, MI, USA); Volker R.W. Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-226-4
Online ISSN 2222-5692
Received 28 September 2020
Revised 19 February 2021
Accepted 21 July 2021
Issue Date 16 April 2022
DOI doi:10.18429/JACoW-ECRIS2020-TUXZO03
Pages 72-77
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.