Author: Takeuchi, Y.
Paper Title Page
Compact High Current H+ ECR Ion Source With Fast Pulse Gas Valve  
  • Y. Iwashita, Y. Takeuchi, H. Tongu
    Kyoto ICR, Uji, Kyoto, Japan
  A compact H+ ECR ion source is under development. For reduction of the gas load to vacuum evacuation systems, the gas injection into the plasma chamber is chopped by a piezo- electric gas valve. To achieve the enough short time constant of gas flow, a small plasma chamber with 50 cm2 is adopted and the chamber is operated in 6 GHz TE111 mode. The magnetic field is generated by permanent magnet for reduction of the required volume. The ECR volume is maximized by a multi mirror magnetic field in a limited plasma chamber volume.  
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