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TY - CONF AU - Mallick, C. AU - Bandyopadhyay, M. AU - Kumar, R.K. AU - Tewari, S.V. ED - Schaa, Volker RW TI - Investigation of 2.45 GHz Microwave Radiated Argon Plasma under Magnetized Condition J2 - Proc. of ECRIS2016, Busan, Korea, August 28 - September 1, 2016 C1 - Busan, Korea T2 - International Workshop on ECR Ion Sources T3 - 22 LA - english AB - Compact microwave discharged ECRIS is one of the most popular devices for space propulsion and material processing .This work models microwave plasma coupling in 2D axis symmetric and investigates plasma parameters and modified electric field in plasma environment. A microwave field of the order of 1.3 x10⁵ V/m is obtained at the center of plasma chamber cavity for an input microwave power of 500W. Microwave radiated plasma has a maximum density of 9.04 x10¹⁶ / m3 after some microwave periods (0.01s).The steady state peak electron temperature is around 3eV under 1 mbar pressure of argon gas. Most of power deposition takes place on the ECR surface which is the 875G contour resonating with the electron frequency. Steady state argon plasma results show that beyond critical plasma density of 7.4x10¹⁶ / m3 most of the microwave power is deposited at the plasma edge. PB - JACoW CP - Geneva, Switzerland SP - 138 EP - 141 KW - ion KW - plasma KW - electron KW - ECR KW - ion-source DA - 2016/10 PY - 2016 SN - 978-3-95450-186-1 DO - 10.18429/JACoW-ECRIS2016-WEPP42 UR - http://jacow.org/ecris2016/papers/wepp42.pdf ER -