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RIS citation export for WEPP08: Development of Compact H⁺ ECR Ion Source with Pulse Gas Valve

TY - CONF
AU - Fuwa, Y.
AU - Ichikawa, M.
AU - Iwashita, Y.
AU - Miyawaki, N.
AU - Tongu, H.
ED - Schaa, Volker RW
TI - Development of Compact H⁺ ECR Ion Source with Pulse Gas Valve
J2 - Proc. of ECRIS2016, Busan, Korea, August 28 - September 1, 2016
C1 - Busan, Korea
T2 - International Workshop on ECR Ion Sources
T3 - 22
LA - english
AB - Compact H⁺ ECR Ion Source using permanent magnets is under development. A pulsed gas injection system achieved by a piezo gas valve can reduce the gas load to a vacuum evacuation system. This feature is suitable when the ion source is closely located to an RFQ. Results of a performance test will be presented.
PB - JACoW
CP - Geneva, Switzerland
SP - 98
EP - 100
KW - ion
KW - ion-source
KW - plasma
KW - ECR
KW - proton
DA - 2016/10
PY - 2016
SN - 978-3-95450-186-1
DO - 10.18429/JACoW-ECRIS2016-WEPP08
UR - http://jacow.org/ecris2016/papers/wepp08.pdf
ER -