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Tamura, J.

Paper Title Page
MOPC147 Measurement of Ion Beam from Laser Ion Source for RHIC EBIS 421
 
  • T. Kanesue
    Kyushu University, Department of Applied Quantum Physics and Nuclear Engineering, Fukuoka
  • M. Okamura
    BNL, Upton, Long Island, New York
  • J. Tamura
    Department of Energy Sciences, Tokyo Institute of Technology, Yokohama
 
  Laser ion source (LIS) is a candidate of the primary ion source for the RHIC EBIS. LIS will provide intense charge state 1+ ions to EBIS for further ionization. We measured plasma properties of a variety of atomic species such as Si, Fe and Au using the second harmonics of Nd:YAG laser (532 nm wave length, up to 0.82 J / 6 ns). Since a suitable laser power density for production of charge state 1+ ions is different from different species, laser power density was optimized to obtain a maximum beam intensity in each species. Also the results of emittance measurement using pepper pot after ion extraction with about 20 kV extraction voltage will be shown. Based on the obtained results, performance of the LIS as the primary ion source for EBIS will be discussed in this paper.  
MOPC148 Target Life Time of Laser Ion Source for Low Charge State Ion Production 424
 
  • T. Kanesue
    Kyushu University, Department of Applied Quantum Physics and Nuclear Engineering, Fukuoka
  • M. Okamura
    BNL, Upton, Long Island, New York
  • J. Tamura
    Department of Energy Sciences, Tokyo Institute of Technology, Yokohama
 
  Laser ion source produces ions by irradiating pulsed laser shots onto the solid state target. For the low charge state ion production, laser spot diameter on the target can be over several millimeters using the high power laser such as Nd:YAG laser (532 nm wave length, 0.82 J / 6 ns). In this case, damages to the target surface is small while there is a visible crater in case of the best focused laser shot (laser spot diameter can be several tens of micrometers) for high charge state ion production. Because damage to the target surface is small, target is not required to be moved to use fresh surface after each laser shot to stabilize plasma. In this paper, the results of target life time measurements will be shown.