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Sattin, M.

Paper Title Page
MOPC139 Refractory Ovens for ECR Ion Sources and Their Scaling 397
 
  • M. Cavenago, A. Galatà, M. Sattin
    INFN/LNL, Legnaro, Padova
  • T. Kulevoy, S. Petrenko
    ITEP, Moscow
 
  The radiofrequency (rf) oven can be used as a metal vapour injector for Electron Cyclotron Resonance ion source; the application to high temperature boiling metals (like Cr, Ti and V) was recently demonstrated. Duration and reusability of oven parts were excellent, since crucible only need to be maintained at a temperature Ts larger than other parts; for vanadium case, achieved Ts was up to 2300 K with about 280 W of rf power, with the present design and size, tailored to our 14.4 GHz ECRIS. Optimization for different sources is discussed, and modern design tools are reviewed. Materials, more than rf power coupling, emerge as ultimate limits. Comparisons of results with resistive oven and sputter probes and with different metals are briefly reported.