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Title |
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| MOPC113 |
Head-on Beam-beam Compensation with Electron Lenses in the Relativistic Heavy Ion Collider
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328 |
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- Y. Luo, N. P. Abreu, E. N. Beebe, J. Beebe-Wang, C. Montag, M. Okamura, A. I. Pikin, G. Robert-Demolaize
BNL, Upton, Long Island, New York
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The working points for polarized proton operation in the Relativistic Heavy Ion Collider (RHIC) are currently constrained between 2/3 and 7/10, and the beam and luminosity lifetimes are limited by head-on beam-beam effects. To further increase the bunch intensity, we propose a low energy Gaussian electron beam, or electron lens, to collide head-on with the proton beam in order to compensate the large tune shift and tune spread generated by the proton-proton collisions in 2 interaction points. In this article, outline of the RHIC head-on beam-beam compensation with e-lenses and parameters for both proton and electron beams are presented.
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| MOPC147 |
Measurement of Ion Beam from Laser Ion Source for RHIC EBIS
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421 |
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- T. Kanesue
Kyushu University, Department of Applied Quantum Physics and Nuclear Engineering, Fukuoka
- M. Okamura
BNL, Upton, Long Island, New York
- J. Tamura
Department of Energy Sciences, Tokyo Institute of Technology, Yokohama
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Laser ion source (LIS) is a candidate of the primary ion source for the RHIC EBIS. LIS will provide intense charge state 1+ ions to EBIS for further ionization. We measured plasma properties of a variety of atomic species such as Si, Fe and Au using the second harmonics of Nd:YAG laser (532 nm wave length, up to 0.82 J / 6 ns). Since a suitable laser power density for production of charge state 1+ ions is different from different species, laser power density was optimized to obtain a maximum beam intensity in each species. Also the results of emittance measurement using pepper pot after ion extraction with about 20 kV extraction voltage will be shown. Based on the obtained results, performance of the LIS as the primary ion source for EBIS will be discussed in this paper.
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| MOPC148 |
Target Life Time of Laser Ion Source for Low Charge State Ion Production
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424 |
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- T. Kanesue
Kyushu University, Department of Applied Quantum Physics and Nuclear Engineering, Fukuoka
- M. Okamura
BNL, Upton, Long Island, New York
- J. Tamura
Department of Energy Sciences, Tokyo Institute of Technology, Yokohama
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Laser ion source produces ions by irradiating pulsed laser shots onto the solid state target. For the low charge state ion production, laser spot diameter on the target can be over several millimeters using the high power laser such as Nd:YAG laser (532 nm wave length, 0.82 J / 6 ns). In this case, damages to the target surface is small while there is a visible crater in case of the best focused laser shot (laser spot diameter can be several tens of micrometers) for high charge state ion production. Because damage to the target surface is small, target is not required to be moved to use fresh surface after each laser shot to stabilize plasma. In this paper, the results of target life time measurements will be shown.
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| WEPC153 |
Dipole Magnet for Use of RHIC EBIS HEBT Line
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2365 |
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- T. Kanesue
Kyushu University, Department of Applied Quantum Physics and Nuclear Engineering, Fukuoka
- M. Okamura, D. Raparia, J. Ritter
BNL, Upton, Long Island, New York
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We present the design optimization of a dipole magnet for use of RHIC EBIS HEBT line. This magnet provides a total bending angle of 145 degrees by two identical magnets and it is used to guide H+ to Au32+ beam with energy of 2 MeV/amu. Magnetic field is required to change within 1 second corresponding to the ion species, so magnet body has the laminated structure to suppress eddy current. Effective length and field quality within a radius of 5 cm was optimized separately. Effective length was optimized by adjusting end shape not to change the beam orbit between low and high field operation more than 1 mm from intended beam orbit after bending. Then field quality was optimized by changing the shim position and additional bump. After modification, all multipole coefficients along the beam trajectory were reduced to within 10x10-4.
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