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Lepercq, P.

Paper Title Page
MOPP162 Titanium Nitride Coating of RF Ceramic Windows by Reactive DC Magnetron Sputtering 931
 
  • V. Variola, H. Jenhani, W. Kaabi, P. Lepercq
    LAL, Orsay
  • G. Keppel, V. Palmieri, F. Strada
    INFN/LNL, Legnaro, Padova
 
  Alumina is a common material for RF windows. Besides its high dielectric strength, it is stable under thermal treatment and has a low out-gassing rate. Nevertheless it has a high secondary electron emission (SEE) coefficient, which leads to multipactor limiting the achievable RF power. One way to suppress the multipactor on RF windows is to coat it with a low SEE-thin TiN film. In the frame of the LAL coupler program a sputtering bench has been developed. It is equipped with two magnetrons and titanium targets. A special rotating holder was designed to allow uniform deposition on cylindrical windows. RF etching of the substrate as a pre-treatment step is allowed, in order to remove particle contamination and to increase TiN adhesion. The TiN sputtering needs the optimisation of gas and electrical parameters. XRD analysis was performed to check the film composition and stoechiometry. The results show how to control the N2 vacancy acting on the gas flow. In addiction, the coating thickness must be optimized not to cause excessive ohmic heating, so multipactor thresholds measurements were done for different coating thickness. Thickness measurments showed a good uniformity.