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Andersson, Å.

Paper Title Page
MOPC045 First Measurement Results of the PSI 500kV Low Emittance Electron Source 169
 
  • M. Pedrozzi, Å. Andersson, R. J. Bakker, R. Ganter, C. Gough, C. P. Hauri, R. Ischebeck, S. Ivkovic, Y. Kim, F. Le Pimpec, K. B. Li, P. Ming, A. Oppelt, M. Paraliev, T. Schietinger, V. Schlott, B. Steffen, A. F. Wrulich
    PSI, Villigen
  • S. C. Leemann
    MAX-lab, Lund
 
  The Paul Scherrer Insitute (PSI) is presently developing a low emittance electron source for the PSI-XFEL project. The target beam parameters at the source are I=5.5 A, Q=0.2 nC and a slice emittance below 0.2 mm.mrad. The gun concept consists of a high gradient "diode“ stage followed by a two-frequency two-cell cavity to allow fine tuning of the longitudinal phase space. This paper reports on the first experimental results obtained with the PSI 500 kV test stand. The facility consists of a 500 kV diode stage followed by a diagnostic beam line including an emittance monitor. An air-core transformer based high voltage pulser is capable of delivering a pulse of 250 ns FWHM with amplitude up to 500 kV. The diode gap between two mirror polished electrodes is adjustable to allow systematic gradient studies. The electrons are produced by a 266nm UV laser delivering 4μJoules on the Cu-cathode.  
WEPC003 Coupling Control at the SLS 1983
 
  • A. Streun, Å. Andersson, M. Böge, A. Luedeke
    PSI, Villigen
 
  The vertical beam size measurement at the Swiss Light Source (SLS) is based on vertically polarized visual light and allows to verify a vertical emittance of a few pm rad, resp. an emittance ratio in the 10-4 range obtained in 400 mA top-up user operation mode by tuning the lattice by means of 24 skew quadrupoles. Suppression of betatron coupling by local and global coupling correction prevents losses of Touschek scattered particles at the narrow vertical gaps of the in-vacuum undulators and thus protects these devices and increases beam lifetime, resp. the top-up interval. We will report on our experience with the beam size monitor, on the method of coupling control and on the achievements in vertical emittance and beam lifetime.