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Witkowski, J.

Paper Title Page
THPCH176 Deposition of Lead Thin Films Used as Photo-cathodes by Means of Cathodic Arc under UHV Conditions 3209
 
  • P. Strzyzewski, J. Langner, M. S. Sadowski, J. Witkowski
    The Andrzej Soltan Institute for Nuclear Studies, Centre Swierk, Swierk/Otwock
  • T. Rao, J. Smedley
    BNL, Upton, Long Island, New York
  • R. Russo, S. Tazzari
    Università di Roma II Tor Vergata, Roma
  • J.S. Sekutowicz
    DESY, Hamburg
 
  The cathodic arc technology has been used for various technical purposes for many years. Recently, it has been demonstrated that the cathodic arc can be operated under ultra-high vacuum (UHV) conditions and it might solve the problem of the oxygen contamination coming from water remnants. It opens a new road to many applications where very pure metallic and/or superconducting films are needed. The paper reports on recent experimental studies aimed on the deposition of superconducting films of pure lead (Pb) by means of the UHV cathodic arc. Such layers can be used as photo-cathodes needed for modern accelerator injectors. The system configuration, used for thin film deposition inside the RF Gun designed at DESY, is also described and the main results and characteristics of thin superconducting Pb-films are presented.