| Paper | Title | Page |
|---|---|---|
| MOPCH029 | Status of the SPARC Project | 110 |
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| The SPARC Project is starting the commissioning of its photo-injector. RF gun, RF sources, RF network and control, power supplies, emittance meter, beam diagnostics and control to measure the RF gun beam are installed. The photocathode drive laser has been characterized in terms of pulse shape and quality. We expect to conduct beam measurements at RF gun exit in the next future and consequently to start the installation of accelerating sections. The design of the 12 m undulator for the FEL experiment has been completed and the first undulator section out of 6 is under construction: we expect to characterize it at Frascati ENEA laboratory within the next months. SPARC as a facility will host FEL experiments using SASE, seeding and non-linear resonant harmonics. Additional R&D on X-band and S-band structures for velocity bunching are in progress, as well as studies on new photocathode materials and exotic undulator designs. We also present studies on solenoid field defects, beam based alignments, exotic electron bunch production (blow-out of short laser pulses or intensity modulated laser pulses). The possible use of segmented superconducting micro-undulators will be discussed too. | ||
| MOPCH168 | Novel Development on Superconducting Niobium Film Deposition for RF Applications | 457 |
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| A new deposition technology has been developed, based on a cathodic arc system working under UHV conditions, to produce metallic thin films. The technique presents several advantages compared to standard sputtering, mainly: ionized state of the evaporated material, absence of gases to sustain the discharge, higher energy of atoms reaching the substrate surface, possibility to apply bias to the substrate and to guide the arc plasma using magnetic fields. Recent results on superconducting Niobium films deposited under several conditions and on sapphire substrate are reported. A cavity deposition system has been developed and the plasma transport to the cavity cell studied | ||
| THPCH176 | Deposition of Lead Thin Films Used as Photo-cathodes by Means of Cathodic Arc under UHV Conditions | 3209 |
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| The cathodic arc technology has been used for various technical purposes for many years. Recently, it has been demonstrated that the cathodic arc can be operated under ultra-high vacuum (UHV) conditions and it might solve the problem of the oxygen contamination coming from water remnants. It opens a new road to many applications where very pure metallic and/or superconducting films are needed. The paper reports on recent experimental studies aimed on the deposition of superconducting films of pure lead (Pb) by means of the UHV cathodic arc. Such layers can be used as photo-cathodes needed for modern accelerator injectors. The system configuration, used for thin film deposition inside the RF Gun designed at DESY, is also described and the main results and characteristics of thin superconducting Pb-films are presented. |