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Sattin, M.

Paper Title Page
TUPLS105 Sputter Probes and Vapor Sources for ECR Ion Sources 1744
 
  • M. Cavenago, A. Galatà, M. Sattin
    INFN/LNL, Legnaro, Padova
  • T. Kulevoy, S. Petrenko
    ITEP, Moscow
 
  Sputter probes are a promising method for injecting controlled quantities of metallic elements inside ECRIS ion source, provided that sputter rate can be controlled, so that high charge states and low sample consumption rate will be attained. Moreover pressure at the probe and inside source should be different. With a simple differential pumping scheme and a sputter probe at 25 mm from ECRIS plasma, a 200 nA current of 120Sn18+ was easily obtained. Typical results (for Sn and Ti) of an inductively heated rf oven are discussed for comparison. Improvements of sputter probe concept and geometry are also described.