| Paper |
Title |
Page |
| TUPCH126 |
Outgassing Rate of Highly Pure Copper Electroplating Applied to RF Cavities
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1307 |
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- T. Abe, T. Kageyama, Y. Saito, H. Sakai, Y. Sato, Y. Takeuchi
KEK, Ibaraki
- Z. Kabeya, T. Kawasumi
MHI, Nagoya
- T. Nakamura, S. Nishihashi, K. Tsujimoto
Asahi Kinzoku Co., Ltd., Gifu
- K. Tajiri
Churyo Engineering Co., Ltd., Nagoya
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We plan to apply a new copper electroplating with a high purity and a high electric conductivity to normal-conducting RF cavities for electron or positron storage rings with a high current beam. As reported in 2005 Particle Accelerator Conference, our first test cavity, made of iron, with the electroplated copper surface finished up by electropolishing showed an excellent electric performance compared with the case of cavities made of oxygen free copper. Our next step is to examine the vacuum performance. This paper reports results of the outgassing-rate measurements on our second test cavity together with its fabrication process.
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| TUPLS107 |
Operation of the Opposite-Field Septum Magnet for the J-PARC Main-Ring Injection
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1750 |
| |
- I. Sakai, Y. Arakaki, K. Fan, Y. Saito, M. Tomizawa, M. Uota
KEK, Ibaraki
- A.K. Kawasaki, H. Mori, A. Tokuchi
NICHICON, Shiga
- Y. Morigaki, A. Nishikawa
IHI/Yokohama, Kanagawa
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The opposite field septum magnet system has been applied to the injection system of the J-PARC 50-GeV proton synchrotron. The features of the system are a force-free structure, easy pulse excitation and the possibility of a large-aperture, thin-septum structure. The septum magnet has the structure of an inside-vacuum to eliminate the thickness of the vacuum-chamber walls and electric-insulation layer to make the septum thickness as thin as possible. However the magnet cores and return coils are outside of the vacuum to reduce the out-gassing rate of the vacuum system. Finally, the larger beam aperture than the full acceptance of the ring and larger separation angle can be obtained at the septum magnet for low-loss injection. In this paper we will introduce the methods to eliminate the error fields caused by fabrication errors and eddy current with pulse excitation and stability of high current power supply of 50 kA.
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