| Paper |
Title |
Page |
| MOPCH027 |
Metal Film Photocathodes for High Brightness Electron Injectors
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104 |
| |
- G. Gatti, L. Cultrera, F. Tazzioli, C. Vicario
INFN/LNF, Frascati (Roma)
- A. Fiori, S. Orlanducci
Università di Roma II Tor Vergata, Roma
- J. Langner, M. S. Sadowski, P. Strzyzewski
The Andrzej Soltan Institute for Nuclear Studies, Centre Swierk, Swierk/Otwock
- A. Perrone
INFN-Lecce, Lecce
- C. Ristoscu
INFLPR, Bucharest - Magurele
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Advanced high brightness injectors require photocathodes with fast response,high quantum efficiency and good surface uniformity. Both Mg films deposited by laser ablation and Pb films deposited by vacuum arc could satisfy these requirements. Their emission and morphology are compared.
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| MOPCH168 |
Novel Development on Superconducting Niobium Film Deposition for RF Applications
|
457 |
| |
- A. Cianchi, L. Catani, D. D. Di Giovenale, J. Lorkiewicz
INFN-Roma II, Roma
- J. Langner, M. S. Sadowski, P. Strzyzewski
The Andrzej Soltan Institute for Nuclear Studies, Centre Swierk, Swierk/Otwock
- V. M. Merlo, M. Salvato, S. Tazzari
Università di Roma II Tor Vergata, Roma
- B.R. Ruggiero, R. Russo
ICIB, Pozzuoli (NA)
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A new deposition technology has been developed, based on a cathodic arc system working under UHV conditions, to produce metallic thin films. The technique presents several advantages compared to standard sputtering, mainly: ionized state of the evaporated material, absence of gases to sustain the discharge, higher energy of atoms reaching the substrate surface, possibility to apply bias to the substrate and to guide the arc plasma using magnetic fields. Recent results on superconducting Niobium films deposited under several conditions and on sapphire substrate are reported. A cavity deposition system has been developed and the plasma transport to the cavity cell studied
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| THPCH176 |
Deposition of Lead Thin Films Used as Photo-cathodes by Means of Cathodic Arc under UHV Conditions
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3209 |
| |
- P. Strzyzewski, J. Langner, M. S. Sadowski, J. Witkowski
The Andrzej Soltan Institute for Nuclear Studies, Centre Swierk, Swierk/Otwock
- T. Rao, J. Smedley
BNL, Upton, Long Island, New York
- R. Russo, S. Tazzari
Università di Roma II Tor Vergata, Roma
- J.S. Sekutowicz
DESY, Hamburg
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The cathodic arc technology has been used for various technical purposes for many years. Recently, it has been demonstrated that the cathodic arc can be operated under ultra-high vacuum (UHV) conditions and it might solve the problem of the oxygen contamination coming from water remnants. It opens a new road to many applications where very pure metallic and/or superconducting films are needed. The paper reports on recent experimental studies aimed on the deposition of superconducting films of pure lead (Pb) by means of the UHV cathodic arc. Such layers can be used as photo-cathodes needed for modern accelerator injectors. The system configuration, used for thin film deposition inside the RF Gun designed at DESY, is also described and the main results and characteristics of thin superconducting Pb-films are presented.
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