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| TUPCH090 |
Electron Beam Profile Measurements with Visible and X-ray Synchrotron Radiation at the Swiss Light Source
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1223 |
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- Å. Andersson, M. Rohrer, V. Schlott, A. Streun
PSI, Villigen
- O.V. Chubar
SOLEIL, Gif-sur-Yvette
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Two different methods of beam profile measurements using a) visible-to-UV range synchrotron radiation b) X-ray synchrotron radiation have been realized in a single diagnostics beam line at the Swiss Light Source. While the visible-to-UV part uses a focusing lens to create an image of the electron beam cross section, the X-ray part makes use of the pinhole camera principle. In the visible-to-UV case the vertically polarized synchrotron radiation renders an image heavily influenced by inherent emission and diffraction effects of synchrotron radiation. This turns out to be an advantageous influence in order to determine ultra small beam profiles. For each of the two methods practical point-spread function measurements, including all beam line components, and high-precision wave-optics based calculations (SRW code) of the synchrotron light characteristics were performed to ensure correct interpretation of the measured profiles. Results from both monitors will be presented to allow comparison.
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