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Rocha, M.

Paper Title Page
THPCH133 Conceptual Design of an EPU for VUV Radiation Production at LNLS 3110
 
  • G. Tosin, R. Basilio, J.F. Citadini, R.T. Neuenschwander, M. Potye, X.R. Resende, M. Rocha, P.F. Tavares
    LNLS, Campinas
 
  We describe the magnetic and mechanical design of an elliptically polarizing undulator (EPU) currently under construction at the (Brazilian Synchrotron Light Source - LNLS). The device is designed to cover the photon flux in the range from 100eV to 1000eV (124Å a 12.4 Å), allowing linear, elliptical and circular polarizations. With this device it is possible to reach absorption edges of several elements such as Si, S, Br, C, N, O, Fe, F, Cl and to measure magnetic dichroism. The EPU's magnetic design is conventional, and field corrections are done by means of virtual shims, with horizontal and vertical displacements. Each one of the four magnetic blocks linear arrays (cassettes) is segmented in seven sub-cassettes. The separate magnetic measurement of each sub-cassette allows corrections of the magnetic field profile to be made before final assembly and makes the verification of mechanical tolerances easier and faster, decreasing the expected time that will be spent in the magnetic tuning of the device. The mechanical structure is composed of a C-Frame, gap and phase actuators. The gaps actuators and phase actuators use absolute encoders and bias with springs to eliminate backlash.