| Paper |
Title |
Page |
| WEPCH004 |
Estimation of Transverse Coupling From Pinhole Images
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1921 |
| |
- X.R. Resende, P.F. Tavares
LNLS, Campinas
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The Brazilian Synchrotron Light Laboratory (LNLS) has recently started filling its storage ring straight sections with insertion devices. Last year a 2-Tesla Wiggler was successfully installed and integrated in the control system. An elliptically polarizing undulator is now under construction and scheduled to be installed in the next shutdown, by the end of the current year. The VUV beamline for the undulator is very demanding with respect to orbit stability and other beam parameters. Considerable reduction of the vertical emittance via reduction of the transverse coupling is a must in order for the undulator beamline to achieve its promised outstanding performance. In this paper we report on recent efforts to better understand the residual coupling in the machine and we describe preliminary proposals of viable solutions that aim at controlling the linear coupling within beamline specifications.
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| THPCH133 |
Conceptual Design of an EPU for VUV Radiation Production at LNLS
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3110 |
| |
- G. Tosin, R. Basilio, J.F. Citadini, R.T. Neuenschwander, M. Potye, X.R. Resende, M. Rocha, P.F. Tavares
LNLS, Campinas
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We describe the magnetic and mechanical design of an elliptically polarizing undulator (EPU) currently under construction at the (Brazilian Synchrotron Light Source - LNLS). The device is designed to cover the photon flux in the range from 100eV to 1000eV (124Å a 12.4 Å), allowing linear, elliptical and circular polarizations. With this device it is possible to reach absorption edges of several elements such as Si, S, Br, C, N, O, Fe, F, Cl and to measure magnetic dichroism. The EPU's magnetic design is conventional, and field corrections are done by means of virtual shims, with horizontal and vertical displacements. Each one of the four magnetic blocks linear arrays (cassettes) is segmented in seven sub-cassettes. The separate magnetic measurement of each sub-cassette allows corrections of the magnetic field profile to be made before final assembly and makes the verification of mechanical tolerances easier and faster, decreasing the expected time that will be spent in the magnetic tuning of the device. The mechanical structure is composed of a C-Frame, gap and phase actuators. The gaps actuators and phase actuators use absolute encoders and bias with springs to eliminate backlash.
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