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| TUPCH010 |
Profile Measurement by Beam Induced Fluorescence for 60 MeV/u to 750 MeV/u Heavy Ion Beams
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1013 |
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- P. Forck, C. Andre, F. Becker, H. Iwase
GSI, Darmstadt
- D. Hoffmann
TU Darmstadt, Darmstadt
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At the planned heavy ion facility FAIR very intense beams of heavy ions will be transported between various synchrotrons and focused on targets for secondary ion productions. For the transverse profile determination only non-destructive methods are suited due to the large deposed beam power. We investigated experimentally the Beam Induced Fluorescence (BIF) method. Due to the atomic collision by the beam ions the residual gas N2 is excited to fluorescence levels. Single photon detection is performed by a double MCP image intensifier coupled to a digital CCD camera. Extensive experimental studies (with the today available lower ion currents) were performed to determine the photon yield and the background contribution for different ion species and beam energies. The measured profiles show a good correspondence to other methods as long as the vacuum pressure by a regulated N2 inlet is below 10-1 mbar. Based on the experimental results, the layout for a BIF profile determination will be discussed.
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