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Multipacting is a common issue in the context of cathode units of superconducting radiofrequency photoinjectors (SRF-guns) utilized in linear accelerators under resonant conditions. In this study, Titanium Nitride (TiN) and Carbon thin films have been prepared by DC and RF magnetron sputtering in a Nitrogen and Argon plasma discharge, respectively. Films featuring a thickness of about 600 nm were produced under various deposition conditions on substrates such as Copper, Molybdenum, and Silicon. Materials characterization was carried out utilizing SEM, Raman and FTIR spectroscopy, XRD and AFM. In order to evaluate the SEY a new device is introduced, which is capable of quasi in-situ measurements. The latter is realized by connecting the coating-, the SEY- and a contamination chamber into one setup allowing sample transfer under UHV conditions. Even after an exposure to air carbon shows SEY values down to 0.69. This value, however, turns out to be quite sensitive with respect to the actual surface morphology. Clean TiN surfaces, on the other hand, displayed a SEY value as low as 1.4. In this case the SEY value is strongly affected by potential surface contamination.
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