Author: Mentink, M.
Paper Title Page
TUIOA06 Deposition of Niobium and Other Superconducting Materials With High Power Impulse Magnetron Sputtering: Concept and First Results 302
 
  • A. Anders, S. Lim, R. Mendelsberg, M. Mentink, A.V. Nollau, J.L. Slack, J.G. Wallig
    LBNL, Berkeley, California, USA
  • G. Yushkov
    Institute of High Current Electronics, Tomsk, Russia
 
  Funding: This work was initially supported by an LDRD grant of Lawrence Berkeley National Laboratory, and by the Office of High Energy Physics, U.S. Department of Energy, under Contract No. DE-AC02-05CH11231.
Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not lived up to high expectations. Energetic condensation of niobium films from the plasma phase has been tried using filtered cathodic arc plasmas, and promising RRR values were recently demonstrated. High power impulse magnetron sputtering (HIPIMS) is a promising emerging coatings technology which combines magnetron sputtering with a pulsed power approach. The magnetron is turned into a metal plasma source by using very high peak power density of ~ 1 kW/cm2. In this contribution, the cavity coatings concept with HIPIMS is explained. A system with two cylindrical, movable magnetrons was set up with custom magnetrons small enough to be inserted into 1.3 GHz cavities. Preliminary data on niobium HIPIMS plasma and resulting coatings are presented. The HIPIMS approach has the potential to be extended to film systems beyond niobium, including other superconducting materials and/or multilayer systems.
 
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