PAC2013 - List of Authors (Felch, S.B.)

Paper

Title

Page

Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators

740

S.B. Felch
Susan Felch Consulting, Los Altos Hills, California, USA
M.I. Current
Current Scientific, San Jose, USA
M.C. Taylor
Taylor Consulting, USA

The implantation of ion beams into materials, primarily semiconductors, is by far the largest industrial accelerator application, with more than 10,000 systems having been sold for this purpose during the past 30 years. This talk should review the status of this very large application.

Slides WEYB2 [15.467 MB]

Paper	Title	Page
WEYB2	Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators	740
	S.B. Felch Susan Felch Consulting, Los Altos Hills, California, USA M.I. Current Current Scientific, San Jose, USA M.C. Taylor Taylor Consulting, USA
	The implantation of ion beams into materials, primarily semiconductors, is by far the largest industrial accelerator application, with more than 10,000 systems having been sold for this purpose during the past 30 years. This talk should review the status of this very large application.
	Slides WEYB2 [15.467 MB]