2011 Particle Accelerator Conference - List of Authors (Ha, K.M.)

Paper	Title	Page
MOP211	NSLS-II RF Beam Position Monitor	495
	K. Vetter, J.H. DeLong, A.J. Della Penna, K.M. Ha, Y. Hu, B.N. Kosciuk, J. Mead, I. Pinayev, O. Singh, Y. Tian BNL, Upton, Long Island, New York, USA G.J. Portmann LBNL, Berkeley, California, USA J.J. Sebek SLAC, Menlo Park, California, USA
	Funding: Work supported by the U.S. DOE under contract No. DE-AC02-98CH10886. An internal R&D program has been undertaken at BNL to develop a sub-micron RF Beam Position Monitor (BPM) for the NSLS-II 3rd generation light source that is currently under construction. The BPM R&D program started in August 2009. Successful beam tests were conducted 15 months from the start of the program. The NSLS-II RF BPM has been designed to meet all requirements for the NSLS-II Injection system and Storage Ring. Housing of the RF BPMs in ±0.1C thermally controlled racks provide sub-micron stabilization without active correction. An active pilot-tone has been incorporated to aid long-term (8hr min) stabilization to 200nm RMS.

Paper

Title

Page

NSLS-II RF Beam Position Monitor

495

K. Vetter, J.H. DeLong, A.J. Della Penna, K.M. Ha, Y. Hu, B.N. Kosciuk, J. Mead, I. Pinayev, O. Singh, Y. Tian
BNL, Upton, Long Island, New York, USA
G.J. Portmann
LBNL, Berkeley, California, USA
J.J. Sebek
SLAC, Menlo Park, California, USA

Funding: Work supported by the U.S. DOE under contract No. DE-AC02-98CH10886.
An internal R&D program has been undertaken at BNL to develop a sub-micron RF Beam Position Monitor (BPM) for the NSLS-II 3rd generation light source that is currently under construction. The BPM R&D program started in August 2009. Successful beam tests were conducted 15 months from the start of the program. The NSLS-II RF BPM has been designed to meet all requirements for the NSLS-II Injection system and Storage Ring. Housing of the RF BPMs in ±0.1C thermally controlled racks provide sub-micron stabilization without active correction. An active pilot-tone has been incorporated to aid long-term (8hr min) stabilization to 200nm RMS.