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MOPWI014 | Design and Development for the Next Generation X-ray Beam Position Monitor System at the APS | 1175 |
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Funding: Work performed at Argonne National Laboratory, operated by UChicago Argonne, LLC, for the U.S. Department of Energy under contract DE-AC02-06CH11357. The proposed Advanced Photon Source (APS) Upgrade will bring storage-ring beam sizes down to several micrometers and require x-ray beam directional stability in 100 nrad range for undulator power exceeding 16 kW. The next generation x-ray beam position monitors (XBPMs) are designed to meet these requirements. We present first commissioning data on the recently installed grazing-incidence insertion device x-ray beam position monitor (GRID-XBPM) based on Cu K-edge x-ray fluorescence from limiting absorbers of the front end for two inline undulators. It demonstrated a 50-fold improvement for signal-to-background ratio over existing photoemission-based XBPMs. Techniques for calibrating the XBPMs will be discussed. We will also present a new XBPM design based Compton scattering from diamond blades. This XBPM is designed for less powerful undulators such as the APS canted-undulator beamlines where each undulator generates < 10 kW of beam power. We will discuss the thermal design of the blade, the optics design of the detector assembly, and computer simulations of expected response to the x-ray beam. Test data of the prototype may be presented if available. |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-MOPWI014 | |
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TUPJE069 | Fast Injection System R&D for the APS Upgrade | 1797 |
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Funding: Results in this report are derived from work performed at Argonne National Laboratory. Argonne is operated by UChicago Argonne, LLC, for the U.S. Department of Energy under contract DE-AC02-06CH11357. The MBA upgrade for the APS will operate with bunch swap out and on axis injection. The planned 324 bunch fill pattern places difficult demands on the injection and extraction kickers. The present concept uses dual stripline kickers driven by high Voltage pulsers. Minimizing perturbation on adjacent bunches requires very fast rise and fall times with relatively narrow ~20 nsec, 15 kV pulses. To achieve these requirements we have initiated a multifaceted R&D program. The R&D includes the HV pulser, stripline kicker and HV feedthrough. We have purchased a commercial dual channel HV pulser and are evaluating its performance and reliability. In addition, we are investigating the feasibility of using nonlinear ferrite loaded coaxial cables (shockwave transmission line) to sharpen the leading and trailing edges of high voltage pulses. We are also developing a prototype kicker and high voltage feedthrough. The requirements for injection and extraction, progress on prototype development and results of our HV pulser investigations will be reported. |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-TUPJE069 | |
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WEPTY014 | Development of Fast Kickers for the APS MBA Upgrade | 3286 |
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Funding: *Work supported by the U.S. Department of Energy, Office of Science, under Contract No. DE-AC02-06CH11357. The APS multi-bend achromat (MBA) upgrade storage ring will support two bunch fill patterns: a 48-singlets and a 324-singlets. A “swap out” injection scheme is adopted. In order to minimize the beam loss and residual oscillation of injected beam and to minimize the perturbation of stored beam during a swap-on injection, the rise, fall, and flat-top parts of the kicker pulse must be held within a 22.8-ns interval. Traditional ferrite-core-type kickers can’t meet the timing requirements; therefore, we decided to use stripline-type kickers. We have completed a preliminary design of a prototype kicker geometry. Procurement of the pulser supply and other components of an evaluation system is under way. We report the specification and design of the fast kicker and current status. |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-WEPTY014 | |
Export • | reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml) | |