Paper | Title | Page |
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WEPJE021 | Fabrication and Demonstration of a Silicon Buried Grating Accelerator | 2717 |
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Funding: Work supported by the U.S. Department of Energy under Grants DE-AC02-76SF00515, DE-FG06-97ER41276. Using optical electromagnetic fields in dielectric microstructures, we can realize higher-energy accelerator systems in a more compact, low-cost form than the current state-of-the-art. Dielectric, laser-driven accelerators (DLA) have recently been demonstrated using fused silica structures to achieve about an order-of-magnitude increase in accelerating gradient over conventional RF structures.* We leverage higher damage thresholds of silicon over metals and extensive micromachining capability to fabricate structures capable of electron acceleration. Our monolithic structure, the buried grating, consists of a grating formed on either side of a long channel via a deep reactive ion etch (DRIE).** The grating imposes a phase profile on an incoming laser pulse such that an electron experiences a net change in energy over the course of each optical cycle. This results in acceleration (or deceleration) as electrons travel down the channel. We have designed and fabricated such structures and begun testing at the SLAC National Accelerator Laboratory. We report on the progress toward demonstration of acceleration in these structures driven at 2um wavelength. * E.A. Peralta et al., Nature 503 (2013) ** C.M. Chang and O. Solgaard, Appl. Phys. Lett. 104 (2014) |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-WEPJE021 | |
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