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RIS citation export for WEPHA020: Titanium Coating of Ceramics for Accelerator Applications

TY - CONF
AU - Vollenberg, W.
AU - Costa Pinto, P.
AU - Holliger, B.
AU - Sapountzis, A.
AU - Taborelli, M.
ED - Henderson, Stuart
ED - Akers, Evelyn
ED - Satogata, Todd
ED - Schaa, Volker R.W.
TI - Titanium Coating of Ceramics for Accelerator Applications
J2 - Proc. of IPAC2015, Richmond, VA, USA, May 3-8, 2015
C1 - Richmond, VA, USA
T2 - International Particle Accelerator Conference
T3 - 6
LA - english
AB - Titanium thin films can be deposited on ceramics, in particular alumina, without adherence problems. Even after air exposure their secondary electron yield is low compared to alumina and can be further reduced by conditioning or beam scrubbing. In addition, depending on the film thickness, titanium provides different surface resistances that fulfil requirements of ceramics in particle accelerators. Titanium thin films (MOhm square range) are used to suppress electron multipacting and evacuate charges from ceramic surfaces. Thicker films (5-25 Ω square range) are applied to lower the surface resistance so that the beam impedance is reduced. In this contribution, we present the results of a development aimed at coating 2-meter long alumina vacuum chambers with a uniform surface resistivity by a dedicated DC magnetron sputtering configuration.
PB - JACoW
CP - Geneva, Switzerland
SP - 3148
EP - 3150
KW - vacuum
KW - cathode
KW - Windows
KW - electron
KW - target
DA - 2015/06
PY - 2015
SN - 978-3-95450-168-7
DO - 10.18429/JACoW-IPAC2015-WEPHA020
UR - http://jacow.org/ipac2015/papers/wepha020.pdf
ER -