Author: Zinovev, A.V.
Paper Title Page
MOPRI058 Metal Plasmonic Nanostructures Functionalized by Atomic Layer Deposition of MgO for Photocathode Applications 739
 
  • S.V. Baryshev, S.P. Antipov, A. Kanareykin
    Euclid TechLabs, LLC, Solon, Ohio, USA
  • M.R. Savina, A.V. Zinovev
    ANL, Argonne, Illinois, USA
  • E. Thimsen
    University of Minnesota, Minneapolis, USA
 
  Funding: Euclid TechLabs LLC acknowledges support from the DOE SBIR program, grant No. DE-SC0009572.
To create high current, long lasting electron sources capable of providing sub-ps bunches, new photocathode concepts are sought. Most recently, plasmonic nanostructured metal surfaces or flat metal surfaces activated by an ultrathin MgO are under great attention. We report on a photocathode design combining these two approaches. It consists of plasmonic Ag nanoparticles (NPs) functionalized by 3 MgO monolayers (MLs). Ag NPs were synthesized by an aerosol method and MgO was grown by atomic layer deposition (ALD). The NPs geometry was tuned to obtain broadband >50% absorption in the entire blue range as evidenced by UV-vis. spectroscopy. The WF of 3 MgO MLs/Ag NPs multilayer was reduced by 1 eV compared to bare NPs, from 5 to 4 eV, as evidenced by UPS and Kelvin probe. Reduction by 1 eV is maximal for this pair of materials, and agrees well with experimental and theoretical findings. While the effect on WF is indeed significant, a special handling protocol for Ag before depositing MgO is a must. It would preserve a clean Ag surface with a WF of nearly 4 eV to achieve 3 eV upon ALD of MgO. This and other issues are under study to promote photocathode applications.
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2014-MOPRI058  
Export • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)