IPAC2014 - List of Authors (Luchinin, G.)

Paper	Title	Page
THPRO022	JINR Powerful Laser Driver Applied for FEL Photoinjector	2906
	E. Syresin, N. Balalykin, M.A. Nozdrin, G. Shirkov, G.V. Trubnikov JINR, Dubna, Moscow Region, Russia E. Gacheva, E. Khazanov, G. Luchinin, S. Mironov, A. Poteomkin, V. Zelenogorsky IAP/RAS, Nizhny Novgorod, Russia
	Funding: The work is funded by the German Federal Ministry of education and Research, project 05K10CHE. The JINR develops a project of superconducting linear accelerator complex, based on a superconducting linear accelerator, for applications in nanoindustry, mainly for extreme ultraviolet lithography at a wavelength of 13.5 nm using kW-scale Free Electron Laser (FEL) light source. The application of kW-scale FEL source permits realizing EUV lithography with 22 nm, 16 nm resolutions and beyond. JINR-IAP collaboration constructed powerful laser driver applied for photoinjector of FEL linear accelerator which can be used for EUV lithography. To provide FEL kW-scale EUV radiation the photoinjector laser driver should provide a high macropulse repetition rate of 10 Hz, a long macropulse time duration of 0.8 ms and 8000 pulses per macropulse. The laser driver operates at wavelength of 260-266 nm on forth harmonic in the mode locking on base of Nd ions or Yb ions The laser driver micropulse energy of 1.6 uJ should provide formation of electron beam in FEL photoinjector with the bunch charge about 1 nC.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2014-THPRO022
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Paper

Title

Page

JINR Powerful Laser Driver Applied for FEL Photoinjector

2906

E. Syresin, N. Balalykin, M.A. Nozdrin, G. Shirkov, G.V. Trubnikov
JINR, Dubna, Moscow Region, Russia
E. Gacheva, E. Khazanov, G. Luchinin, S. Mironov, A. Poteomkin, V. Zelenogorsky
IAP/RAS, Nizhny Novgorod, Russia

Funding: The work is funded by the German Federal Ministry of education and Research, project 05K10CHE.
The JINR develops a project of superconducting linear accelerator complex, based on a superconducting linear accelerator, for applications in nanoindustry, mainly for extreme ultraviolet lithography at a wavelength of 13.5 nm using kW-scale Free Electron Laser (FEL) light source. The application of kW-scale FEL source permits realizing EUV lithography with 22 nm, 16 nm resolutions and beyond. JINR-IAP collaboration constructed powerful laser driver applied for photoinjector of FEL linear accelerator which can be used for EUV lithography. To provide FEL kW-scale EUV radiation the photoinjector laser driver should provide a high macropulse repetition rate of 10 Hz, a long macropulse time duration of 0.8 ms and 8000 pulses per macropulse. The laser driver operates at wavelength of 260-266 nm on forth harmonic in the mode locking on base of Nd ions or Yb ions The laser driver micropulse energy of 1.6 uJ should provide formation of electron beam in FEL photoinjector with the bunch charge about 1 nC.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2014-THPRO022

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)