Author: Lee, E.H.
Paper Title Page
MOPPP056 Injection Transient Motion at PLS-II 688
 
  • I. Hwang, T. Ha, Y.D. Joo, C. Kim, M. Kim, S.H. Kim, B.-J. Lee, E.H. Lee, S. Shin
    PAL, Pohang, Kyungbuk, Republic of Korea
 
  PLS-II is an upgraded third generation synchrotron which includes many insertion devices with improved beam properties. Top-up operation is short time-interval injection to make roughly constant current and is essential to provide high intensity beam. When the electrons are injected to synchrotron, the stored beam is disturbed by small error of the injection system and the beam quality at the beamline can be decreased. We present this injection transient motion at PLS-II.  
 
TUOBB02 Commissioning of the PLS-II 1089
 
  • S. Shin, J.Y. Choi, T. Ha, J.Y. Huang, I. Hwang, W.H. Hwang, Y.D. Joo, C. Kim, D.T. Kim, D.E. Kim, J.M. Kim, M. Kim, S.H. Kim, S.-C. Kim, S.J. Kwon, B.-J. Lee, E.H. Lee, H.-S. Lee, H.M. Lee, J.W. Lee, S.H. Nam, E.S. Park, I.S. Park, S.S. Park, S.J. Park, Y.G. Son, J.C. Yoon
    PAL, Pohang, Kyungbuk, Republic of Korea
  • J-Y. Kim, B.H. Oh
    KAERI, Daejon, Republic of Korea
  • J. Lee
    POSTECH, Pohang, Kyungbuk, Republic of Korea
 
  The Pohang Light Source (PLS) has operated for 14 years successfully. To meet the request of the increasing user community, the PLS-II that is the upgrade project of PLS has been completed. Main goals of the PLS-II are to increase beam energy to 3 GeV, to increase number of insertion devices by the factor of two (20 IDs), to increase beam current to 400 mA and to reduce beam emittance below 10 nm with existing PLS tunnel and injection system. The PLS-II had been commissioned over the six months. During commissioning, we achieved 14 insertion devices operation and top-up operation with 100 mA beam current and 5.8 nm beam emittance. In this presentation, we report the experimental results from the PLS-II commissioning.  
slides icon Slides TUOBB02 [3.484 MB]