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TY - CONF AU - Willard, J. AU - Wilson, T. AU - Wurtz, W.A. ED - Schaa, Volker RW ED - Costa, Isidre ED - Fernández, David ED - Matilla, Ãscar TI - Compensation Controls for an Elliptically Polarising Undulator J2 - Proc. of ICALEPCS2017, Barcelona, Spain, 8-13 October 2017 C1 - Barcelona, Spain T2 - International Conference on Accelerator and Large Experimental Control Systems T3 - 16 LA - english AB - At the Canadian Light Source (CLS) synchrotron, the addition of the Quantum Materials Spectroscopy Centre (QMSC) beamline requires the addition of an Elliptically Polarizing Undulator (EPU) insertion device to produce photons from the stored electron beam. Unlike the majority of such insertion devices, this EPU is capable of producing photons of simultaneous arbitrary elliptical and linear phases, in addition to a range of energies. This EPU is also capable of creating perturbations of the stored electron beam sufficient to cause an interruption of an injection. In order to prevent this, compensation controls have been developed. These controls are accomplished with a combination of Experimental Physics and Industrial Control System (EPICS), mathematical models, and algorithms written in C and MATLAB. PB - JACoW CP - Geneva, Switzerland SP - 1658 EP - 1662 KW - ion KW - controls KW - software KW - quadrupole KW - undulator DA - 2018/01 PY - 2018 SN - 978-3-95450-193-9 DO - 10.18429/JACoW-ICALEPCS2017-THPHA120 UR - http://jacow.org/icalepcs2017/papers/thpha120.pdf ER -