Author: Vignet, J.L.
Paper Title Page
WEPC20 Bunch Extension Monitor for LINAC of SPIRAL2 facility 720
  • R.V. Revenko, J.L. Vignet
    GANIL, Caen, France
  Funding: This work is funded in frame of CRISP project.
Measurements of the bunch longitudinal shape of beam particles are crucial for optimization and control of the LINAC beam parameters and maximization of its integrated luminosity. The non-interceptive bunch extension monitor for LINAC of SPIRAL2 facility is being developed at GANIL. The five bunch extension monitors are to be installed on the entrance of LINAC between superconducting cavities. The principle of monitor operation is based on registration of x-rays induced by ions of accelerator beam and emitted from thin tungsten wire. The monitor consists of two parts: system for wire insertion and positioning and x-ray detector based on microchannel plates. The prototype of detector has been developed and was tested using protons and heavy ions beams.
poster icon Poster WEPC20 [9.366 MB]  
WEPF14 A New Low Intensity Beam Profile Monitor for SPIRAL2 841
  • J.L. Vignet, P. Gangnant, E. Guéroult, J. Pancin
    GANIL, Caen, France
  In order to obtain profiles of SPIRAL 2 ion beams, several beam profile monitors are presently being developed at GANIL. One of them is a low-intensity beam-profile monitor (EFM). This Emission-Foil Monitor (EFM) will be used in the radioactive beam lines of SPIRAL2 and in the experimental rooms of this new facility. The ions produce secondary electrons when they are stopped in an aluminium emissive foil. The electrons are then guided in an electric field placed parallel to a magnetic field in a double-stage microchannel plate (MCP). A 2D pixelated pad plane placed below the MCP is then used to collect the signal. The magnetic field created by permanent magnets in a closed magnetic circuit configuration permits the beam-profile reconstruction to be achieved with good resolution. The EFM can visualize beam-profile intensities between only a few pps to as much as 109 pps and with energies as low as several keV. This profiler has been under development since 2011 and is actually manufactured. For the signal acquisition, a new dedicated electronics system will be employed. Recent results of this monitor and its associated electronics will be presented here.