HIAT2015 - List of Authors (Sato, F.)

Paper	Title	Page
WEPB21	New Dual-Type Electron Cyclotron Resonance Ion Source for Universal Source on Synthesized Ion Beams	241
	Y. Kato, T. Iida, F. Sato Osaka University, Graduate School of Engineering, Osaka, Japan
	A new concept on magnetic field of plasma production and confinement has been proposed to enhance efficiency of an electron cyclotron resonance (ECR) plasma for broad and dense ion beam source under the low pressure.* We make this source a part of new dual-type ion source for the first stage. We are also constructing the large bore second stage for synthesizing ions, extraction and beam analysis. We investigate feasibility and hope to realize the device which has wide range operation window in a single device to produce many kinds of ion beams, e.g., from multiply charged, to molecular, cluster ions, nanotube, fullerenes, including impurities trapped as Fe@C60, etc, as like to universal source based on ECR ion source (ECRIS). We consider to being necessary to device that is available to individual operations with different plasma parameters, and then obtain concept of dual ECRIS from relevant previous works. We conduct both of ion beams analysis and investigation of plasma parameters on produced plasmas. We describe construction of the new dual-type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as can be a universal source. *Y. Kato et al., Pro. HIAT09, Venice, Italy, 2009, p326, http://accelconf.web.cern.ch/AccelConf/HIAT2009/papers/e-03.pdf
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Paper

Title

Page

New Dual-Type Electron Cyclotron Resonance Ion Source for Universal Source on Synthesized Ion Beams

241

Y. Kato, T. Iida, F. Sato
Osaka University, Graduate School of Engineering, Osaka, Japan

A new concept on magnetic field of plasma production and confinement has been proposed to enhance efficiency of an electron cyclotron resonance (ECR) plasma for broad and dense ion beam source under the low pressure.* We make this source a part of new dual-type ion source for the first stage. We are also constructing the large bore second stage for synthesizing ions, extraction and beam analysis. We investigate feasibility and hope to realize the device which has wide range operation window in a single device to produce many kinds of ion beams, e.g., from multiply charged, to molecular, cluster ions, nanotube, fullerenes, including impurities trapped as Fe@C60, etc, as like to universal source based on ECR ion source (ECRIS). We consider to being necessary to device that is available to individual operations with different plasma parameters, and then obtain concept of dual ECRIS from relevant previous works. We conduct both of ion beams analysis and investigation of plasma parameters on produced plasmas. We describe construction of the new dual-type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as can be a universal source.
*Y. Kato et al., Pro. HIAT09, Venice, Italy, 2009, p326, http://accelconf.web.cern.ch/AccelConf/HIAT2009/papers/e-03.pdf

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