Author: Kim, Y.
Paper Title Page
Compact FEL Facilities for the Next Generation EUV Lithography  
  • Y. Kim, H.K. Cha, Y.U. Jeong, B.C. Lee
    KAERI, Daejon, Republic of Korea
  • Y.W. Parc
    PAL, Pohang, Kyungbuk, Republic of Korea
  Recently, for highly cost-effective productivity, chip manufacturers such as Samsung, Hynix, and Intel have been developing a next generation extreme ultraviolet (EUV) lithography technology. Due to the current low average power limitation, however, a new light source with a shorter wavelength of around 13.5 nm and a sufficient average photon beam power higher than 1 kW is strongly requested for the EUV lithography. In 2014, we had several meetings on the EUV lithography with Korean major chip manufactures. In this paper, we report manufactures' requirements and concerns on FEL based light source for the EUV lithography. In addition, we also describe possible compact FEL facilities for the next generation EUV lithography.  
THP010 Analysis of Beam Stability in the KAERI Ultrashort Pulse Accelerator 697
  • H.W. Kim, S. Bae, B.A. Gudkov, K.H. Jang, Y.U. Jeong, Y. Kim, K. Lee, S.V. Miginsky, J. Mun, S. H. Park, S. Park, N. Vinokurov
    KAERI, Daejon, Republic of Korea
  • K.H. Jang, Y.U. Jeong, H.W. Kim, K. Lee, S.V. Miginsky, S. H. Park, N. Vinokurov
    UST, Daejeon City, Republic of Korea
  • S.V. Miginsky, N. Vinokurov
    BINP SB RAS, Novosibirsk, Russia
  An RF-photogun-based linear accelerator for the Korea Atomic Energy Research Institute (KAERI) ultrashort pulse facility is under construction. It has a symmetry structure with four different beamlines. The UED beamlines will generate ultrashort electron pulses with over 106 electrons per pulse for the single-shot measurements on femtoseconds dynamics of atomic or molecular structures. Electron bunches with an energy of ~3 MeV from the RF photogun can be compressed up to less than 50 fs by achromatic and isochronous bends. The intrinsic r.m.s. timing jitter of the pulses through the bends is estimated to be less than 30 fs with the r.m.s. energy fluctuation of 0.1%. In the THz pump and X-ray probe beamline, two successive laser pulses with a time interval of ~10 ns are used to generate two electron bunches having bunch charges more than 100 pC. Two electron bunches are accelerated by a linac up to ~25 MeV and separated into individual beamlines by a fast kicker. We will present on estimated timing jitter and effects of magnet errors to the beam dynamics in the accelerator by considering beam dilution effects.