Paper | Title | Page |
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THPD11 | The JLAB UV Undulator | 567 |
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Recently the JLAB FEL has demonstrated 150 W at 400 nm and 200 W at 700 nm* using a 33mm period undulator designed and built by STI Optronics. This paper describes the undulator design and performance. Two key requirements were low phase error, zero steering and offset end fields and small rms trajectory errors. We will describe a new genetic algorithm that allowed phase error minimization to 1.8 degrees while exceeding specifications. The mechanical design, control system and EPICS interface will also be summarized.
*S. V. Benson et al., "Beam Line Commissioning of a UV/VUV FEL at Jefferson Lab, presented at the 2011 FEL Conference, Shanghai, China, Aug. 2011 |
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