Vanderbilt University, Nashville, TN
LANL, Los Alamos, New Mexico
Recently, the theory of the Smith-Purcell free-electron laser has been confirmed by the experiments of Andrews, et al. [1], and of Gardelle, et al. [2] In addition, high-brightness cathodes have been developed using field-emission from arrays of diamond pyramids [3]. By combining these developments we have designed an ultracompact (“shirt-pocket”) free-electron laser and we have begun constructing the device. The electron beam comprises an array of 2-micron diamond-pyramid field emitters that overfills an einzel lens 200-microns wide and 1-mm long, fabricated using ps-laser machining. The beam is accelerated to 10 keV and focused in the short dimension over a lamellar metal grating with a period of 150 microns and a length of 10 mm. The predicted start current at a wavelength of {10}84 microns is 11 mA, which corresponds to 9 A/cm2 at the cathode, before focusing. We have tested cathodes at 30 A/cm2 and 600 mA total current; higher current density should be possible.
[1] Andrews, et al, JAP {10}5, 024904 (2009)
[2] Andrews, et al, PRST-AB 12, 080703 (2009)
[3] Gardelle, et al, PRST-AB 12, 110701 (2009)
[4] Jarvis, et al, JVSTB 27, 2264 (2009)
[5] Jarvis, Thesis, 2009
Falcon Analytics, Netanya
BINP SB RAS, Novosibirsk
HZB, Berlin
Lithography over the last years has been actively used to produce more compact and powerful computers. The dimensions of the microchips still require shorter wavelengths of light to enhance future ‘nano’ scale production. It is envisaged that 193 nm lithography is beginning to reach its limit. Extreme Ultraviolet (EUV) lithography of 13.5 nm wavelength could provide a solution for the next step of miniaturization, however presently no light source exists with sufficient average power. We report here results of a study, showing the feasibility of a FEL EUV source driven by a multi-turn superconducting energy-recovery linac (ERL). The proposed 40x20 m2 facility will be located underground for radiation safety purposes. With MW-scale consumption from the power grid it is estimated to provide 5 kW of average EUV power. We elaborate in some detail the SASE option, which is presently technically feasible, however regenerative-amplifier option should be also kept in mind. The proposed design is based on a short-period (2-3 cm) undulator. The corresponding electron beam energy is about 0.6-0.8 GeV. The proposed accelerator consists of photoinjector, booster, and a multi-turn ERL.
SLAC, Menlo Park, California
LBNL, Berkeley, California
A complete optical system including grating monochromator and mirrors was designed to provide self-seeding of the soft X-ray undulators to be possibly built as part of the LCLS-II project. The grating monochromator consisted of a cylindrical horizontally focusing mirror, a plane vertically deflecting pre-mirror, a variable-line-spacing plane vertically deflecting grating, a horizontal exit slits, and a spherical vertically collimating mirror. The grating monochromator was designed to operate in the fixed-focus mode and tuning of the energy was designed to be achieved by rotations of only the pre-mirror and the grating. Only one ruling of 2200 l/mm was needed to cover the energy range from 200 to 2000 eV with an almost constant resolving power of greater than 22700. The monochromator would produce fully transform-limited pulses of 12 fs (rms) long at 2000 eV or 120 fs (rms) long at 200 eV with sufficient power to allow seeding. The optical system produced a slightly energy-dependent time delay of about 10 ps. The transverse size of the input beam was preserved in the horizontal direction, but was reduced in the vertical direction depending on the tuning energy.
DESY Zeuthen, Zeuthen
DESY, Hamburg
UCLA, Los Angeles, California
HZB, Berlin
The major objectives of the Photo-Injector Test Facility at DESY in Zeuthen, PITZ, are research and development of high brightness electron sources suitable to drive FELs like FLASH and the European XFEL. In the 2008/2009 run period the facility has been operated with a new photo-cathode laser system and a dry-ice cleaned RF gun cavity. Characterization of the transverse phase space of the electron source has been performed in details using a single slit scan technique with a dedicated Emittance Measurement System. In preparation for the forthcoming run, a number of quadrupole magnets have been installed and tomography reconstruction with data from quadrupole scans with two magnets has been carried out in semi-parallel manner to the slit scans. This contribution summarizes the experience from the phase-space tomography reconstruction with nominal beam conditions. Advantages and drawbacks of the measurement procedure and the analysis are superimposed and results are compared to ones obtained with the slit scans.
JASRI/SPring-8, Hyogo-ken
A laser-induced Schottky-effect-gated photocathode gun has been developed since 2006. This new type of gun utilizes a laser’s coherency to realize a compact laser source using Z-polarization of the IR laser on the cathode. This Z-polarization scheme reduces the laser pulse energy by reducing the cathode work function due to Schottky effect. A hollow laser incidence scheme is applied with a hollow convex lens that is focused after passing the beam through a radial polarizer. According to our calculations (convex lens: NA=0.15; 60-% hollow ratio), a Z-field of 1 GV/m needs 1.26 MW at peak power for the fundamental wavelength (792 nm). Therefore, we expect that this laser-induced Schottky emission requires just a compact femtosecond laser oscillator. We observed the first emission with a hollow laser incidence scheme (copper cathode illuminated by THG: 264 nm as a pilot experiment). The net charge of 21 pC with 100-fs laser pulse (pulse energy: 2.5 μJ; spot diameter: 200 μm). The maximum cathode surface field was 97 MV/m. This new scheme of gun will be investigated on several metal photocathode materials by comparing radial and azimuthal polarizations at 264, 396,792 nm.