| Paper |
Title |
Page |
| TUPMN020 |
Velocity Bunching at the European XFEL
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959 |
| |
- T. Limberg, B. Beutner, W. Decking, M. Dohlus, K. Floettmann, M. Krasilnikov
DESY, Hamburg
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This paper explores the possibility to employ velocity bunching in the first RF module of the European XFEL to increase the peak current at the injector exit. The current increase will reduce the total longitudinal bunch compression factor and loosen rf jitter tolerances by the same amount. The relation between rf tolerances and micro-bunching instability gain is discussed and the injector optimization for cases of velocity bunching to 100A and 200A peak current are presented in detail. Finally, plans for velocity bunching experiments at the FLASH facility (Free Electron Laser in Hamburg) are laid out.
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| THPAN026 |
Beam Profile Measurements and Analysis at FLASH
|
3283 |
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- E. Prat, W. Decking, T. Limberg, F. Loehl
DESY, Hamburg
- K. Honkavaara
Uni HH, Hamburg
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FLASH (Free Electron LASer in Hamburg) is a SASE FEL user facility at DESY, Hamburg. It serves also as a pilot project for the European XFEL. Although the slice emittance is a more appropriate parameter to characterize the SASE process, the projected emittance is a good indicator of the electron beam quality which can be measured in an easy and fast way. In this paper we present measurements of the projected emittance along FLASH. We also analyze the effect of the dispersion on transverse electron beam profiles.
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