Author: Valizadeh, R.
Paper Title Page
WEPIK100 The Applicability of NEG Coated Undulator Vessels for the CLARA FEL Test Facility 3181
 
  • O.B. Malyshev, K.B. Marinov, K.J. Middleman, N. Thompson, R. Valizadeh, P.H. Williams
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
  • O.B. Malyshev, K.J. Middleman, N. Thompson, R. Valizadeh, P.H. Williams
    Cockcroft Institute, Warrington, Cheshire, United Kingdom
 
  CLARA is a FEL test facility at Daresbury Laboratory (DL), UK. The undulator vacuum chamber is 20 m long with inner diameter 6 mm and its vacuum performance can benefit from a NEG coating. The thickness of the coating layer must be carefully optimised. A layer ~ 1 um would help the vacuum but a thinner layer would be partially transparent for the EM field reducing the resistive wall wakefields due to the NEG. A very thin layer, however, may not yield the necessary vacuum performance. Two types of NEG coatings produced at DL - dense and columnar - were considered. Their bulk conductivities were measured in a separate study. The resistive wall wakefield impedance was calculated following the standard approach for multilayer vessels. A 250 fs rms electron bunch was generated in ASTRA and its wakefield was obtained from the vessel impedance. The FEL performance was then studied through GENESIS simulations and the result compared to the case with no wakefields. It was found that NEG layers thicker than 100 nm give an unacceptable reduction of the FEL power and the vacuum performance of such thin coatings is unknown. Possible solutions to this problem are discussed.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-WEPIK100  
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WEPIK107 Comparison Studies of Graphene Sey Results in NSRL and DL 3196
 
  • J. Wang, Y. Wang, B. Zhang, Y.X. Zhang
    USTC/NSRL, Hefei, Anhui, People's Republic of China
  • B.S. Sian, R. Valizadeh
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
  • P.V. Tyagi
    STFC/DL, Daresbury, Warrington, Cheshire, United Kingdom
  • R. Valizadeh, G.X. Xia
    Cockcroft Institute, Warrington, Cheshire, United Kingdom
  • G.X. Xia
    UMAN, Manchester, United Kingdom
  • G.L. Yu
    University of Manchester, Manchester, United Kingdom
 
  Graphene has many excellent properties, such as high electron carrier mobility, good thermal conductivity and transparency etc. The secondary electron yield (SEY) of graphene with copper substrate had been studied in National Synchrotron Radiation Laboratory (NSRL) of China. The results show that the maximum SEY ('max) of 6~8 layers graphene film with copper substrates is about 1.25. Further studies indicate that many factors can affect the SEY test results. The recent SEY tests of graphene films with copper substrates in Daresbury Laboratory (DL) of UK gave the maximum SEY of as-received copper, graphene samples with copper substrates are 1.89, 1.83, and 1.68, respectively, under the incident charge per unit surface (Q) of 7.6×10-8 C 'mm-2. Meanwhile, the SEY test parameters and measurement results of graphene in both laboratories are compared and analysed. The effect of defects on the SEY results of graphene films with copper substrate is also discussed.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-WEPIK107  
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MOPVA100 Atomic Layer Deposition of Niobium Nitride from Different Precursors 1094
 
  • P. Pizzol, P. Chalker, J.W. Roberts, J. Wrench
    The University of Liverpool, Liverpool, United Kingdom
  • O.B. Malyshev, R. Valizadeh
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
 
  Advancements in technology have taken bulk niobium cavities close to their theoretical operational limits of 45 MV/m, pushing the research to explore novel materials, such as niobium based alloys . Theoretical studies suggest that a composite material composed of alternative superconductor / insulator multilayers would surpass the bulk niobium limits. Chemical vapour deposition (CVD) can deposit mi-crons thick Nb films in less than an hour, at the expense of precise thickness control. Atomic layer deposition (ALD), instead, even if considerably slower than CVD can be used in applications where the thickness of the deposited layers needs to be controlled with a resolution down to the nanometer. This article presents the preliminary results obtained by using plasma assisted ALD techniques to deposit NbN based compounds starting from chlorinated precursors and organic ones, and the design for a new deposition system currently being built at the Daresbury Laboratories.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA100  
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MOPVA104 Physical Vapour Deposition of NbTiN Thin Films for Superconducting RF Cavities 1102
 
  • S. Wilde, B. Chesca
    Loughborough University, Loughborough, Leicestershire, United Kingdom
  • E. Alves
    Associação EURATOM/IST, Instituto de Plasmas e Fusão Nuclear, Lisboa, Portugal
  • N.P. Barradas
    Universidade de Lisboa, Instituto Superior Técnico, Bobadela, Portugal
  • A.N. Hannah, O.B. Malyshev, N. Pattalwar, S.M. Pattalwar, R. Valizadeh
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
  • G.B.G. Stenning
    STFC/RAL/ISIS, Chilton, Didcot, Oxon, United Kingdom
 
  The production of superconducting coatings for radio frequency cavities is a rapidly developing field that should ultimately lead to acceleration gradients greater than those obtained by bulk Nb RF cavities. The use of thin films made from superconductors with thermodynamic critical field, HC>HCNb, allows the possibility of multilayer superconductor ' insulator ' superconductor (SIS) films and accelerators that could operate at temperatures above the 2 K typically used. SIS films theoretically allow increased acceleration gradient due to magnetic shielding of underlying superconducting layers [1] and higher operating temperature can reduce cost [2]. High impulse magnetron sputtering (HiPIMS) and pulsed DC magnetron sputtering processes were used to deposit NbTiN thin films onto Si(100) substrate. The films were characterised using scanning electron microscopy (SEM), x-ray diffraction (XRD), Rutherford back-scattering spectroscopy (RBS) and a four-point probe.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA104  
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TUPAB111 Energy Distribution and Work Function Measurements for Metal Photocathodes with Measured Levels of Surface Roughness 1580
 
  • L.B. Jones, T.S. Beaver, B.L. Militsyn, T.C.Q. Noakes, R. Valizadeh
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
  • S. Mistry
    STFC/DL, Daresbury, Warrington, Cheshire, United Kingdom
  • S. Mistry
    Loughborough University, Leicestershre, United Kingdom
 
  Funding: The work is part of EuCARD-2, partly funded by the European Commission, GA 312453.
The minimum achievable emittance in an electron accelerator depends strongly on the intrinsic emittance of the photocathode electron source which is measureable as the mean longitudinal and transverse energy spreads in the photoemitted electrons. Reducing emittance in an accelerator driving a Free Electron Laser (FEL) delivers significant reduction in the saturation length for an x-ray FEL, reducing machine cost and increasing x-ray beam brightness. There are many parameters which affect the intrinsic emittance of a photocathode. Surface roughness is a significant factor*, and consequently the development of techniques to manufacture low roughness photocathodes with optimum emission properties is a priority for the electron source community. In this work, we present transverse energy distribution and work function measurements made using our TESS facility** for electrons emitted from copper and molybdenum photocathodes with differing levels of measured surface roughness.
* Proc. FEL '06, THPPH013, 583-586
** Proc. FEL '13, TUPPS033, 290-293
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-TUPAB111  
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