NAPAC2019 - List of Authors (Nasu, I.)

Paper	Title	Page
WEPLM47	Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid	699
SUPLS04	use link to see paper's listing under its alternate paper code
	D. Luo, E.S. Metzgar, L. Popielarski, K. Saito, S.M. Shanab, G.V. Simpson FRIB, East Lansing, Michigan, USA T. Nakajima, I. Nasu, J. Taguchi Nomura Plating Co, Ltd., Osaka, Japan
	Funding: U.S. National Science Foundation under Grant PHY-1565546. In our previous studies of High Field Q-slope (HFQS) we have concluded that nitrogen contamination from the nitric acid is the main cause of the degradation of the Q in buffered chemical polished cavities. Our conclusion is made based on previously unresolved phenomena which are found from huge amount of published cavity test data, include fine grain, large grain and single crystal cavities treated with EP and BCP. According to this analysis, we have started developing new nitrogen-free chemical polishing acid. Hydrogen peroxide with HF mixture was reported able to react with Nb, and there’s no extra element contamination in it, so we replace the conventional BCP with this mixture to start our study. In this paper, some Nb coupon sample results with new acid will be reported. We complete the first step of developing the new acid and we got the Nb finish roughness no worse than conventional BCP.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-NAPAC2019-WEPLM47
About •	paper received ※ 13 September 2019 paper accepted ※ 04 December 2019 issue date ※ 08 October 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

WEPLM47

Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid

699

SUPLS04

use link to see paper's listing under its alternate paper code

D. Luo, E.S. Metzgar, L. Popielarski, K. Saito, S.M. Shanab, G.V. Simpson
FRIB, East Lansing, Michigan, USA
T. Nakajima, I. Nasu, J. Taguchi
Nomura Plating Co, Ltd., Osaka, Japan

Funding: U.S. National Science Foundation under Grant PHY-1565546.
In our previous studies of High Field Q-slope (HFQS) we have concluded that nitrogen contamination from the nitric acid is the main cause of the degradation of the Q in buffered chemical polished cavities. Our conclusion is made based on previously unresolved phenomena which are found from huge amount of published cavity test data, include fine grain, large grain and single crystal cavities treated with EP and BCP. According to this analysis, we have started developing new nitrogen-free chemical polishing acid. Hydrogen peroxide with HF mixture was reported able to react with Nb, and there’s no extra element contamination in it, so we replace the conventional BCP with this mixture to start our study. In this paper, some Nb coupon sample results with new acid will be reported. We complete the first step of developing the new acid and we got the Nb finish roughness no worse than conventional BCP.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-NAPAC2019-WEPLM47

About •

paper received ※ 13 September 2019 paper accepted ※ 04 December 2019 issue date ※ 08 October 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)