JACoW logo

Joint Accelerator Conferences Website

The Joint Accelerator Conferences Website (JACoW) is an international collaboration that publishes the proceedings of accelerator conferences held around the world.


BiBTeX citation export for MOPLO04: Progress in Time-Resolved MeV Transmission Electron Microscopy at UCLA

@InProceedings{denham:napac2019-moplo04,
  author       = {P.E. Denham},
  title        = {{Progress in Time-Resolved MeV Transmission Electron Microscopy at UCLA}},
  booktitle    = {Proc. NAPAC'19},
  pages        = {243--246},
  paper        = {MOPLO04},
  language     = {english},
  keywords     = {electron, quadrupole, cavity, alignment, detector},
  venue        = {Lansing, MI, USA},
  series       = {North American Particle Accelerator Conference},
  number       = {4},
  publisher    = {JACoW Publishing, Geneva, Switzerland},
  month        = {10},
  year         = {2019},
  issn         = {2673-7000},
  isbn         = {978-3-95450-223-3},
  doi          = {10.18429/JACoW-NAPAC2019-MOPLO04},
  url          = {http://jacow.org/napac2019/papers/moplo04.pdf},
  note         = {https://doi.org/10.18429/JACoW-NAPAC2019-MOPLO04},
  abstract     = {We describe here two new enhancements developed for the time-resolved microscope at the UCLA PEGASUS Lab based on the use of a radiofrequency photoinjector as an ultrafast electron source and permanent magnet quadrupoles as electron lenses. The first enhancement is a flexible optical column design including hybrid-style stronger focusing quadrupoles, yielding a 60% magnification increase, and a collimator to improve imaging contrast. This new optical system will have the ability to switch between real-space imaging and diffraction pattern imaging with variable magnification. The second enhancement is a high-frequency (X-band) cavity downstream from the (S-band) photoinjector to reduce the beam energy spread. These enhancements are crucial for improving contrast and image quality. In addition, a pulse-wire alignment method to fiducialize the quadrupole positions to better than 20-um precision is used to reduce the aberrations induced by misalignment and achieve spatial resolution at the 20 nm-level.},
}