| Title |
Upgrade of the Klystron Modulator of the L-Band Electron Linac at Osaka University for Higher Stability |
| Authors |
- K. Furukawa, G. Isoyama
ISIR, Osaka, Japan
- R. Kato
KEK, Ibaraki, Japan
- K. Kawase
HSRC, Higashi-Hiroshima, Japan
- A. Tokuchi
Pulsed Power Japan Laboratory Ltd., Kusatsu-shi Shiga, Japan
|
| Abstract |
The klystron modulator for the L-band linac is upgraded for higher stability. The two-step charging system for the pulse forming network (PFN) is upgraded by adding a high impedance resonant charging line in parallel with the main line. The charging step of the PFN voltage is reduced considerably near the setting value by switching the main resonance line off so that the charging current flows only through the high impedance line. The second model of the solid-state switch is developed using 60 static-induction thyristors, ten of which are connected in series with six such series connected in parallel to meet maximum specifications of 25 kV and 6 kA. The air-cooling capacity is reinforced so that repetition rate is increased from 10 pps for the first model to 60 pps. The fluctuation and accuracy of the klystron voltage are measured to be 7.8×10⁻⁶ or 7.8 ppm for the upgraded klystron modulator using a differential amplifier with much higher sensitivity than one used in the previous measurement.
|
| Paper |
download MOPLR018.PDF [0.782 MB / 3 pages] |
| Poster |
download MOPLR018_POSTER.PDF [0.840 MB] |
| Export |
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| Conference |
LINAC2016, East Lansing, MI, USA |
| Series |
Linear Accelerator Conference (28th) |
| Proceedings |
Link to full LINAC2016 Proccedings |
| Session |
Poster Session |
| Date |
26-Sep-16 16:00–17:00 |
| Main Classification |
1 Electron Accelerators and Applications |
| Sub Classification |
1A Electron Linac Projects |
| Keywords |
klystron, resonance, impedance, linac, high-voltage |
| Publisher |
JACoW, Geneva, Switzerland |
| Editors |
Yoshishige Yamazaki (FRIB/MSU, East Lansing, MI, USA); Alberto Facco (FRIB/MSU, East Lansing, MI, USA); Amy McCausey (FRIB/MSU, East Lansing, MI, USA); Volker RW Schaa (GSI, Darmstadt, Germany) |
| ISBN |
978-3-95450-169-4 |
| Published |
May 2017 |
| Copyright |
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