Title |
Considerations for the Ultrahard X-ray Undulator Line of the European XFEL |
Authors |
- E. Schneidmiller, V. Balandin, W. Decking, M. Dohlus, N. Golubeva, D. Nölle, M.V. Yurkov, I. Zagorodnov
DESY, Hamburg, Germany
- G. Geloni, Y. Li, S. Molodtsov, J. Pflüger, S. Serkez, H. Sinn, T. Tanikawa, S. Tomin
EuXFEL, Schenefeld, Germany
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Abstract |
The European XFEL is a multi-user X-ray FEL facility based on superconducting linear accelerator. Presently, three undulators (SASE1, SASE2, SASE3) routinely deliver high-brightness soft- and hard- X-ray beams for users. There are two empty undulator tunnels that were originally designed to operate with spontaneous radiators in the range 20-90 keV. We consider, instead a possible installation of two FEL undulators. One of them (SASE4) is proposed for operation in a standard (7-25 keV) range as well as in ultrahard (25-100 keV) regime. We discuss a possible location and length of SASE4, modifications of electron beam transport, beam dynamics, choice of undulator technology, different operation modes (SASE and advanced lasing concepts) etc.
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Paper |
download TUPRB023.PDF [0.346 MB / 4 pages] |
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Conference |
IPAC2019 |
Series |
International Particle Accelerator Conference (10th) |
Location |
Melbourne, Australia |
Date |
19-24 May 2019 |
Publisher |
JACoW Publishing, Geneva, Switzerland |
Editorial Board |
Mark Boland (UoM, Saskatoon, SK, Canada); Hitoshi Tanaka (KEK, Tsukuba, Japan); David Button (ANSTO, Kirrawee, NSW, Australia); Rohan Dowd (ANSTO, Kirrawee, NSW, Australia); Volker RW Schaa (GSI, Darmstadt, Germany); Eugene Tan (ANSTO, Kirrawee, NSW, Australia) |
Online ISBN |
978-3-95450-208-0 |
Received |
14 May 2019 |
Accepted |
23 May 2019 |
Issue Date |
21 June 2019 |
DOI |
doi:10.18429/JACoW-IPAC2019-TUPRB023 |
Pages |
1732-1735 |
Copyright |
Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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