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https://doi.org/10.18429/JACoW-IPAC2019-THPGW043
Title Conceptual design of a MeV Ultrafast Electron Diffraction Based on 1.4 Cell RF Gun
Authors
  • J.J. Li, H.M. Chen, K. Fan, Y. Song, P. Yang, Y.T. Yang
    HUST, Wuhan, People’s Republic of China
Abstract Ultrafast Electron Diffraction (UED) is a powerful tool to investigate the dynamic structure with temporal scale of 100 femtoseconds and spatial scale of atomic length. To achieve high quality diffraction patterns, the transverse emittance and the longitudinal length of electron bunches should be reduced. MeV UED, using photocath-ode RF gun instead of traditional DC gun, is being developed to produce high quality electron bunches with lower emittance and shorter length. We are developing a MeV UED facility based on a 1.4 cell photocathode RF gun that can provide higher acceleration gradient at Huazhong University of Science and Technology. In this paper, the conceptual design of the MeV UED is pro-posed with typical parameters of the system, as well as the ASTRA simulation results of optimization.
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Conference IPAC2019
Series International Particle Accelerator Conference (10th)
Location Melbourne, Australia
Date 19-24 May 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Mark Boland (UoM, Saskatoon, SK, Canada); Hitoshi Tanaka (KEK, Tsukuba, Japan); David Button (ANSTO, Kirrawee, NSW, Australia); Rohan Dowd (ANSTO, Kirrawee, NSW, Australia); Volker RW Schaa (GSI, Darmstadt, Germany); Eugene Tan (ANSTO, Kirrawee, NSW, Australia)
Online ISBN 978-3-95450-208-0
Received 11 May 2019
Accepted 21 May 2019
Issue Date 21 June 2019
DOI doi:10.18429/JACoW-IPAC2019-THPGW043
Pages 3679-3681
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.