IPAC2018 - List of Authors (Zhang, S.C.)

Paper	Title	Page
THPMK120	Hefei Advanced Light Source: A Future Soft X-Ray Diffraction-Limited Storage Ring at NSRL	4598
	L. Wang, Z.H. Bai, N. Hu, H.T. Li, W. Li, G. Liu, Y. Lu, Q. Luo, D.R. Xu, W. Xu, P.H. Yang, Z.H. Yang, S.C. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	To meet the fast-growing demands for high-quality low-energy photon beams, a new synchrotron radiation light source conception was brought forward several years ago by National Synchrotron Radiation Laboratory, which was named Hefei Advanced Light Source (HALS). The dominant radiation of HALS will be located in the VUV and soft X-ray region, which will be complementary with that of SSRF and HEPS. Except for high brilliance, high transverse coherence will be another signature feature of HALS. To achieve these goals, a multi-bend achromat based diffraction-limited storage ring was adopted as the main body of HALS. The general description and preliminary design of HALS will be briefly presented in this paper. Under the support of the Chinese Academy of Sciences and local government, the preliminary research and development (R&D) for HALS is undergoing. Several key technologies will be developed in the R&D project, which will lay good foundation for the construction of HALS.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK120
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPMK125	Development of Non-Evaporable Getter (NEG) Coatings on Small Diameter Vacuum Chambers for Diffraction-Limited Storage Ring	4611
	S. Wang, Y.Z. Hong, R. Huang, X.T. Pei, Y. Wang, W. Wei, B. Zhang, S.C. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK125
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPMK132	Generation of Terahertz Synchrotron Radiation Using Laser-Bunch Slicing at Hefei Light Source	4626
	W. Xu, S.W. Wang, S.C. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	Hefei Light Source is a second-generation low-energy synchrotron light source. The low energy machine is ca- pable of generating intense Terahertz radiation through co- herent synchrotron radiation. To realize this, one method is to shorten the bunch length to the same level of its radi- ation wavelength, e.g. by adopting low-α lattice. Another method is to modulate the electron bunch to produce mi- costructure at picosecond scale and intense Terahertz co- herent synchrotron radiation can be obtained due to the in- crease ofthebunchformfactor. This techniqueis calledthe laser bunch slicing method which introduces a laser beam into an undulator to interact with the electron bunches. In this paper we report our work on the simulation of the laser bunch slicing at Hefei Light Source.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK132
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

Hefei Advanced Light Source: A Future Soft X-Ray Diffraction-Limited Storage Ring at NSRL

4598

L. Wang, Z.H. Bai, N. Hu, H.T. Li, W. Li, G. Liu, Y. Lu, Q. Luo, D.R. Xu, W. Xu, P.H. Yang, Z.H. Yang, S.C. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

To meet the fast-growing demands for high-quality low-energy photon beams, a new synchrotron radiation light source conception was brought forward several years ago by National Synchrotron Radiation Laboratory, which was named Hefei Advanced Light Source (HALS). The dominant radiation of HALS will be located in the VUV and soft X-ray region, which will be complementary with that of SSRF and HEPS. Except for high brilliance, high transverse coherence will be another signature feature of HALS. To achieve these goals, a multi-bend achromat based diffraction-limited storage ring was adopted as the main body of HALS. The general description and preliminary design of HALS will be briefly presented in this paper. Under the support of the Chinese Academy of Sciences and local government, the preliminary research and development (R&D) for HALS is undergoing. Several key technologies will be developed in the R&D project, which will lay good foundation for the construction of HALS.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK120

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPMK125

Development of Non-Evaporable Getter (NEG) Coatings on Small Diameter Vacuum Chambers for Diffraction-Limited Storage Ring

4611

S. Wang, Y.Z. Hong, R. Huang, X.T. Pei, Y. Wang, W. Wei, B. Zhang, S.C. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK125

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPMK132

Generation of Terahertz Synchrotron Radiation Using Laser-Bunch Slicing at Hefei Light Source

4626

W. Xu, S.W. Wang, S.C. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

Hefei Light Source is a second-generation low-energy synchrotron light source. The low energy machine is ca- pable of generating intense Terahertz radiation through co- herent synchrotron radiation. To realize this, one method is to shorten the bunch length to the same level of its radi- ation wavelength, e.g. by adopting low-α lattice. Another method is to modulate the electron bunch to produce mi- costructure at picosecond scale and intense Terahertz co- herent synchrotron radiation can be obtained due to the in- crease ofthebunchformfactor. This techniqueis calledthe laser bunch slicing method which introduces a laser beam into an undulator to interact with the electron bunches. In this paper we report our work on the simulation of the laser bunch slicing at Hefei Light Source.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK132

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)