IPAC2018 - List of Authors (Wang, Y.)

Paper	Title	Page
THPMK125	Development of Non-Evaporable Getter (NEG) Coatings on Small Diameter Vacuum Chambers for Diffraction-Limited Storage Ring	4611
	S. Wang, Y.Z. Hong, R. Huang, X.T. Pei, Y. Wang, W. Wei, B. Zhang, S.C. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK125
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THPML128	Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film	4980
	Y.X. Zhang, X.Q. Ge, S.W. Wang, Y. Wang, W. Wei, B. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	Amorphous carbon (a-C) thin film applied to vacuum chambers of high-energy particle accelerators can decrease secondary electron yield（SEY）and suppress electron-cloud effectively. A dc magnetron sputtering apparatus to obtain a-C film has been designed. With the equipment, a-C thin film can be deposited on the inner face of stainless steel pipes ultimately which is uniform and high-quality. Meanwhile, it is found that a-C has a low SEY＜1.2 measured by the secondary electron emission measurement set-up in the National Synchrotron Radiation Laboratory. The result indicates that a-C is an ideal material for modern accelerators.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPML128
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THPML129	Deposition and Characterization of TiZrHfV films by DC Magnetron Sputtering	4983
	X.Q. Ge, T.L. He, X.T. Pei, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	The new generation of accelerators places higher demands on the surfaces of vacuum chamber materials. Search for low secondary electron yield (SEY) materials and an effective vacuum chamber surface treatment process, which can effectively reduce the electronic cloud effect, are important early works for the new generation of accelerators. In this work, we revealed the SEY characteristics of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films which were deposited on Si (111) substrates using direct current magnetron sputtering method. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). With the same parameters, the maximum SEY of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films are 1.24 and 1.51, respectively. These results are of great significance for the next-generation particle accelerators.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPML129
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Paper

Title

Page

Development of Non-Evaporable Getter (NEG) Coatings on Small Diameter Vacuum Chambers for Diffraction-Limited Storage Ring

4611

S. Wang, Y.Z. Hong, R. Huang, X.T. Pei, Y. Wang, W. Wei, B. Zhang, S.C. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK125

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THPML128

Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film

4980

Y.X. Zhang, X.Q. Ge, S.W. Wang, Y. Wang, W. Wei, B. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

Amorphous carbon (a-C) thin film applied to vacuum chambers of high-energy particle accelerators can decrease secondary electron yield（SEY）and suppress electron-cloud effectively. A dc magnetron sputtering apparatus to obtain a-C film has been designed. With the equipment, a-C thin film can be deposited on the inner face of stainless steel pipes ultimately which is uniform and high-quality. Meanwhile, it is found that a-C has a low SEY＜1.2 measured by the secondary electron emission measurement set-up in the National Synchrotron Radiation Laboratory. The result indicates that a-C is an ideal material for modern accelerators.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPML128

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPML129

Deposition and Characterization of TiZrHfV films by DC Magnetron Sputtering

4983

X.Q. Ge, T.L. He, X.T. Pei, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

The new generation of accelerators places higher demands on the surfaces of vacuum chamber materials. Search for low secondary electron yield (SEY) materials and an effective vacuum chamber surface treatment process, which can effectively reduce the electronic cloud effect, are important early works for the new generation of accelerators. In this work, we revealed the SEY characteristics of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films which were deposited on Si (111) substrates using direct current magnetron sputtering method. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). With the same parameters, the maximum SEY of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films are 1.24 and 1.51, respectively. These results are of great significance for the next-generation particle accelerators.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPML129

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reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)