IPAC2018 - List of Authors (Wang, S.)

Paper	Title	Page
THPMK125	Development of Non-Evaporable Getter (NEG) Coatings on Small Diameter Vacuum Chambers for Diffraction-Limited Storage Ring	4611
	S. Wang, Y.Z. Hong, R. Huang, X.T. Pei, Y. Wang, W. Wei, B. Zhang, S.C. Zhang USTC/NSRL, Hefei, Anhui, People's Republic of China
	Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK125
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Paper

Title

Page

Development of Non-Evaporable Getter (NEG) Coatings on Small Diameter Vacuum Chambers for Diffraction-Limited Storage Ring

4611

S. Wang, Y.Z. Hong, R. Huang, X.T. Pei, Y. Wang, W. Wei, B. Zhang, S.C. Zhang
USTC/NSRL, Hefei, Anhui, People's Republic of China

Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-THPMK125

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)