| Title |
S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography |
| Authors |
- N. Nakamura, R. Kato, T. Miyajima, M. Shimada
KEK, Ibaraki, Japan
- R. Hajima
QST, Tokai, Japan
- T. Hotei
Sokendai, Ibaraki, Japan
|
| Abstract |
An energy recovery linac(ERL)-based free electron laser(FEL) is a possible candidate of a high-power EUV source for lithography. The ERL can provide a high-current and high-quality electron beam for the high-power FEL and also greatly reduce the dumped beam power and activation compared to ordinary linacs. An ERL-based EUV-FEL source has been designed using available technologies and resources*. For this design, we perform Start-to-End(S2E) simulation from the electron gun to the exit of the decelerating main linac to track the electron beam parameters and to evaluate the FEL performance. The electron bunches from the injector are off-crest accelerated to 800 MeV and compressed in the 1st arc and/or chicane to obtain a high-peak current for high FEL output. After the undulator section for SASE FEL, they are decompressed in the 2nd arc and then decelerated in the main linac to optimize the energy spread or the energy recovery efficiency. This paper will present the S2E simulation for the designed EUV-FEL source.
|
| Footnotes & References |
* N. Nakamura et al., Proc. of ERL2015, Stony Brook, NY, USA, pp.4-9. |
| Paper |
download MOPVA020.PDF [0.667 MB / 4 pages] |
| Export |
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※ EndNote |
| Conference |
IPAC2017, Copenhagen, Denmark |
| Series |
International Particle Accelerator Conference (8th) |
| Proceedings |
Link to full IPAC2017 Proccedings |
| Session |
Posters Monday 3 |
| Date |
15-May-17 16:00–18:00 |
| Main Classification |
02 Photon Sources and Electron Accelerators |
| Sub Classification |
A18 Energy Recovery Linacs (ERLs) |
| Keywords |
FEL, linac, electron, simulation, injection |
| Publisher |
JACoW, Geneva, Switzerland |
| Editors |
Volker RW Schaa (GSI, Darmstadt, Germany); Gianluigi Arduini (CERN, Geneva, Switzerland); Juliana Pranke (ESS, Lund, Sweden); Mike Seidel (PSI, Villigen, Switzerland); Mats Lindroos (ESS, Lund, Sweden) |
| ISBN |
978-3-95450-182-3 |
| Published |
May 2017 |
| Copyright |
|
