| Title |
Control System Integration of MAX IV Insertion Devices |
| Authors |
- J. Lidón-Simon, N.S. Al-Habib, H.Y. Al-Sallami, A. Dupre, V.H. Hardion, M. Lindberg, P. Sjöblom, A. Thiel, G. Todorescu
MAX IV Laboratory, Lund University, Lund, Sweden
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| Abstract |
During the last 2.5 years, MAX IV have installed and commissioned in total 15 insertion devices out of which 6 are new in vacuum undulators, 1 in vacuum wiggler, and 7 in-house developed and manufactured Apple II elliptical polarized undulators. From the old lab, MAXLAB, 1 PU is also reused. Looking forward, 3 additional insertion devices will be installed shortly. As MAX IV only has one Control and IT group, the same concept of machine and beamline installation have been applied also to the insertion devices, i.e. Sardana, Tango, PLC, and IcePAP integration. This has made a seamless integration possible to the rest of the facility in terms of user interfaces, alarm handling, archiving of status, and also future maintenance support.
|
| Paper |
download MOPHA132.PDF [7.231 MB / 5 pages] |
| Poster |
download MOPHA132_POSTER.PDF [4.755 MB] |
| Export |
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| Conference |
ICALEPCS2019 |
| Series |
International Conference on Accelerator and Large Experimental Physics Control Systems (17th) |
| Location |
New York, NY, USA |
| Date |
05-11 October 2019 |
| Publisher |
JACoW Publishing, Geneva, Switzerland |
| Editorial Board |
Karen S. White (ORNL, Oak Ridge, TN, USA); Kevin A. Brown (BNL, Upton, NY, USA); Philip S. Dyer (BNL, Upton, NY, USA); Volker RW Schaa (GSI, Darmstadt, Germany) |
| Online ISBN |
978-3-95450-209-7 |
| Online ISSN |
2226-0358 |
| Received |
30 September 2019 |
| Accepted |
11 October 2019 |
| Issue Date |
30 August 2020 |
| DOI |
doi:10.18429/JACoW-ICALEPCS2019-MOPHA132 |
| Pages |
525-529 |
| Copyright |
 Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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